Overview
The Elionix ELS-BODEN 50kV is an ultra-high precision thermal field emission (TFE) electron beam lithography (EBL) system developed to meet the market needs for next-generation nanometric applications.聽 The tool enables high resolution nanoscale device patterning of standard semiconductor, metal, and dielectric materials. The tool combines high performance, exceptional versatility, and ease of use for both the tool and the software.
Capabilities
- Emission source: Zr/W thermal field emitter
- Writing current: 100 pA-100 nA
- Operating voltage: 50 kV
- Beam size: 2 nm at 50kV using high beam current
- Detectors:
- Two SE2 (secondary electron) detectors
- One In-Lens detector
- Magnification >200kX
- Sample holders:聽
- Three sample holders for wafers, small pieces, and irregularly-shaped samples
- Grounding clips available on all holders
- Small piece holder can hold up to 9 small pieces
- Maximum sample size: 1 8 inch diameter wafer
- Maximum sample height: 1 mm
- Write field size: 100 x 100 渭m to 1500 x 1500 渭m
- Minimum feature size: 10 nm wide lines dependent on column parameters, sample and resist type
- Airlock for quick sample exchange (~2 minutes)
- Precision stage controller with laser interferometer stage, enables:
- Laser height sensor to control sample height, keeping 聽sample in focus during exposure
- Stitching accuracy of +/-15nm (100 x 100 渭m write field)
- Overlay accuracy of +/-20nm (100 x 100 渭m write field)
- Metrology
- Off-line Elionix PC for CAD design and patterning-setup
- Optical microscope prealigner and sample registration:聽 enables unattended automatic operation of multiple EBL exposures and simplified tagging of regions-of-interest
Contact
-
VINSE Cleanroom
Dr. Ben Schmidt, Manager
Dr. Christina McGahan
Megan Dernberger- 111 Engineering Science Building