VINSE is excited to announce that the Elionix ELS-BODEN 50 electron beam lithography (EBL) system is now available to users in the cleanroom.
The new tool brings a major boost in both resolution and throughput, enabling fabrication of features as small as 10 nm while reducing write times from days to just hours. With advanced automation, dynamic write-field correction, and a range of beam currents for nanoscale to large-area patterning applications, the BODEN makes high-performance nanofabrication faster and more efficient than ever.
The system also features automated multilayer alignment with accuracies of 卤20 nm and a optical prealigner that streamlines sample setup and minimizes resist exposure.
For training and access information, please visit: EBL Elionix ELS-BODEN